化学气相沉积 in a sentence

• Characterization of zn 2 183 ; h2o synthesized by cvd
  化学气相沉积产物的表征
• Magnetic - field - aided plasma enhanced chemical vapor deposition
  磁场辅助等离子体增强化学气相沉积
• Cv chemical vapor deposition cv equipment
  化学气相沉积法设备
• Cvd chemical vapor deposition equipment
  化学气相沉积法设备
• In situ reflectivity measurement of cvd diamond thin film
  化学气相沉积金刚石薄膜生长的原位反射率测量
• Advance of optical chemical vapor deposition diamond thin films
  化学气相沉积光学级金刚石薄膜的研究进展
• Electrochemical properties of chemically vapor deposited carbon electrode
  化学气相沉积碳电极的电化学特性
• Chemical vapor deposition process
  化学气相沉积
• Chemical vaporous depositon
  化学气相沉积法
• Synthesis of large area of aligned carbon nanotube by chemical vapor deposition
  化学气相沉积法制备大面积定向碳纳米管
• Thin copper films prepared by chemical vapor deposition on glass - ceramic substrates
  玻璃陶瓷基板上铜薄膜的化学气相沉积
• Ultralong single crystal silicon nanowires synthesized by chemical vapor deposition
  超长单晶硅纳米丝的化学气相沉积法制备
• Boron - doped silicon nanowires grown by plasma - enhanced chemical vapor deposition
  等离子体增强化学气相沉积法实现硅纳米线掺硼
• Polycrystalline diamond coatings for tools are laid down using chemical vapor deposition
  工具用的复晶钻石涂层，则是使用化学气相沉积法制造的。
• Oriented growth of diamond film on si via plasma enhanced hot filament chemical vapor deposition
  等离子体增强热丝化学气相沉积法生长取向金刚石薄膜
• Single walled carbon nanotube ; chemical vapor deposition ; schottky barriers ; field - effect transistor
  单壁碳纳米管化学气相沉积肖特基势垒场效应晶体管
• For the first time , diamond film is grown on tisi2 surface coated on si substrate using hfcvd method
  采用热灯丝化学气相沉积( hfcvd )法，首次在单晶si衬底上长有tisi _ 2薄膜的表面沉积出金刚石薄膜。
• The growth of carbon nanotubes at low temperature was studied by thermal chemical vapor deposition and plasma chemical vapor deposition methods
  本论文分别以化学气相沉积法及电浆辅助化学气相沉积法探讨于低温下合成奈米碳管。
• Lectures and laboratory sessions focus on basic processing techniques such as diffusion , oxidation , photolithography , chemical vapor deposition , and more
  课堂讲授和实验课重点介绍了基本制程技术，如扩散、氧化、光刻、化学气相沉积等。
• A ) si thin film with sub - micro thickness was epitaxial grown on heavy - doped si substrate by ultra high vacuum chemical vapor deposition ( uhv - cvd )
  A )利用超高真空化学气相沉积( uhv - cvd )技术在重掺si衬底上生长高晶体质量的亚微米级薄硅外延片。

• 化学气相沉积 in English：chemical vapor deposition process
• 化学气相沉积 in French：dépôt chimique en phase vapeur
• 化学气相沉积 in Japanese：化学気相成長
• 化学气相沉积 in Korean：화학기상증착
• 化学气相沉积 in Russian：химическое осаждение паров