e-beam evaporation in a sentence
- Internal field generated by contact potential of gate electrode and substrate is considered to be responsible for the enhancement of c - v hysteresis . we first incorporate e - beam evaporation of hf with post thermal oxidation to fabricate hfo2 for the application of gate dielectrics
- At last , the designed hr phase retardance films are produced by use of the e - beam evaporation equipment , then the phase retardance and the reflection of it are measured by lambda 900 spectrophotometer and the type of m - 2000ui ellipsometer . and the error of hr phase retardance film is analyzed
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